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Micropatterned Filters

Our micropatterned optical filters combine patented microlithography expertise with state-of-the-art coating technology to enable smaller and simpler optical designs for portable or complex optical systems. This exclusive technology allows patterning multiple dielectric, metal, and color filter arrays on a single substrate.


Standard & Custom Micropatterning

Standardized processes have been developed and are used today to manufacture these filter arrays in a new, world-class optical semiconductor waferfab designed explicitly for this purpose. The process is scalable to wafer-level glass or semiconductor volume production and supports millions of custom micropatterned optical devices delivered annually.

Torrent Photonics' patterned coatings are used to enhance performance in many biomedical, industrial, and aerospace OEM applications – enabling next-generation integrated optical devices that are more compact, robust, and cost-effective.

The equipment in our Class 100/1000 wafer fabrication cleanrooms have been selected and custom-designed for micropatterned coatings, enabling us to support ultra-small (μm) pixel-level features for imaging applications. We use the latest coating technology, including IAD evaporation, magnetron sputtering, and ion beam sputtering techniques.

Semiconductor-style mask aligners handle wafers up to 8 inches in the lithography fab.

Design & Materials

  • Custom Wavelength Bands | UV, VIS, NIR, SWIR
  • Dichroic | Bandpass, Short-Wave Pass, Long-Wave Pass, BBAR and More
  • Metallic | High Reflector, Dark Absorber, Apertures, Neutral Density and More
  • Sensors

Optical Technology

  • Multispectral Sensing for Spectroscopy
  • Multispectral Imaging with Custom CCD and CMOS Sensors
  • Precision Reticles and Alignment Patterns
  • Patterned Pixels and Apertures
  • Focal Plane Arrays (FPA)
  • Variable/Gradient Filters

    Patents cover our patterned optical filters in micro-patterning technologies (US patent 7648808) and pixel filter array on substrate (either on glass or directly on sensor/detector wafers) methodologies (US patent 6638668).


  • Non-Invasive Biomedical Imaging
  • Remote Sensing for Satellites, Defense, and Precision Agriculture
  • Industrial Quality Control Sensing and Imaging
  • Color Mixing for Entertainment Lighting
  • Light Intensity Control in Industrial Equipment
  • Sensing for Consumer Wearables
  • Integrated Custom Optics for Scientific Devices

Designed For Your Success

Our operations focus on supporting customers in developing their next-generation imaging and sensing equipment. With a toolbox of processes and technologies, we can quickly design the most effective way to develop products based on your application or product functionality. Our application engineers work with you to quickly assess your requirements and provide a proposal of technical feasibility.

Designed For Your Success

Design Parameters and Decisions Factors


Semiconductor wafers, optical-grade glass, fused silica, or other materials

Number of Bands

Number of filter bands combined on one substrate (multispectral sensing)

Filter Design Parameters

Transmission bands and blocking specifications

Feature Geometries

Smallest size and tolerance in position


Alignment accuracies and available alignment markers

Handling, Testing, Packaging

Defined (e.g., ESD) handling, dicing, finishing, testing, and packaging

Filter Types

Bayer Filters
Active Wafer Deposition
Mosaic Filters
Linear Variable Filters & LVBPF
Stripe Filters
Butcher Block Filters
Gradient Filters

Connect with our experts to start your project.

We specialize in laser optic applications used in high-power and ultrafast lasers.